Moscow Mayor Sergei Sobyanin publicly announced that the Zelenograd Nanotechnology Center from Moscow has completed the research and development of Russia's first 350nm lithography machine and will soon be put into mass production.
In May 2024, Russia disclosed that it had completed the assembly of its first domestic lithography machine and was testing it to produce 350nm chips.
Sergey Sobyanin has now released the first physical photo of a Russian domestic 350nm lithography machine.
He emphasized: "There are less than 10 countries in the world that have the ability to manufacture this kind of key semiconductor equipment, and Russia has become one of them. This is a key step for Russia to localize microelectronics and achieve technological independence."
According to his disclosure, Russian lithography machines are completely different from similar foreign equipment. They do not use mercury lamps as light sources. Instead, they use solid-state lasers for the first time, which have the advantages of high power, high energy efficiency, long life, and concentrated spectrum.
At the same time, the working area of the Russian lithography machine has reached 22x22 mm, and it can manufacture wafers with a maximum diameter of 200mm.
It is worth mentioning that the DUV laser light source technology successfully developed by the Chinese Academy of Sciences in my country is also completely based on solid-state design and is expected to advance to the 3nm node. However, it currently has the disadvantages of low power and low frequency.
The 350nm process seems very backward, but it can still meet some needs in the fields of automobiles, energy, communications and other fields, and Russia is continuing to promote the research and development of 130nm lithography machines, which is expected to be completed next year.
In addition, Russia has mastered the 65nm process manufacturing technology, but relies on imported equipment from abroad, and is currently preparing for the localization of 65nm.