New solid-state lasers can produce 193-nanometer light for precision chip manufacturing and even produce vortex beams with orbital angular momentum—a first that could transform quantum technology and manufacturing. Deep ultraviolet (DUV) lasers emit high-energy light with extremely short wavelengths and play an important role in semiconductor manufacturing, high-resolution spectroscopy, precision materials processing, and quantum technology. Deep UV lasers have better coherence and lower power consumption than traditional excimer or gas discharge lasers, allowing for smaller, more efficient systems.

Compact deep-UV solid-state laser generates vortices at 193nm wavelength. Image source: H. Xuan (Greater Bay Area Branch of the Institute of Aerospace Information, Chinese Academy of Sciences)

In a recent study published in Advanced Photonics Nexus, researchers at the Chinese Academy of Sciences announced a major breakthrough: a compact solid-state laser system that can produce coherent light with a wavelength of 193 nanometers. This specific wavelength is a key tool in photolithography, a technique used to etch fine patterns on silicon wafers that are essential for making modern electronic devices.

The new laser system operates at a 6kHz repetition rate and uses a custom-made Yb:YAG crystal amplifier to generate the base laser at 1030nm. The laser is divided into two paths: one is converted into a 258nm beam through fourth harmonic generation, with an output power of 1.2 watts; the other supplies power to the optical parametric amplifier, producing a 1553nm beam with a power of 700 milliwatts. The two beams are then combined using cascaded lithium triborate (LBO) crystals to produce targeted 193nm light with an average output power of 70 milliwatts and a linewidth below 880MHz.

The researchers also introduced a spiral phase plate into the 1553-nanometer beam before mixing, thereby generating a vortex beam carrying orbital angular momentum. This is the first time a 193nm vortex beam has been generated from a solid-state laser. This beam is expected to be the seed for hybrid ArF excimer lasers and may have significant applications in wafer processing, defect detection, quantum communications and optical micromanipulation.

This innovative laser system not only improves the efficiency and precision of semiconductor lithography, but also opens up new avenues for advanced manufacturing technology. The ability to generate 193nm vortex beams could lead to further breakthroughs in the field, potentially revolutionizing the way electronic devices are produced.

Compiled from /ScitechDaily