Recently, it has been widely reported on the Internet that Tsinghua University has overtaken in a corner and has broken through the EUV lithography machine project, achieving a huge lithography machine. The factory has also been established in Xiongan New Area, as shown in the picture below: Is this really a domestic lithography machine factory? No, China Electronics Institute gave a detailed explanation: This is the Beijing High Energy Synchrotron Radiation Source Project (HEPS)!
HEPS is located on the bank of Yanqi Lake in Huairou, Beijing. It is a major scientific and technological infrastructure for the country’s “13th Five-Year Plan”.
It is my country's first high-energy synchrotron radiation light source and one of the brightest fourth-generation synchrotron radiation light sources in the world. Construction began as early as 2019 and will be put into use by the end of 2025.
△Real photos of the Beijing High Energy Synchrotron Radiation Light Source Project
The function of HEPS is to accelerate the electron beam to 6GeV through an accelerator, then inject it into a storage ring with a circumference of 1,360 meters, and keep it running at a speed close to the speed of light.
When the electron beam passes through bending magnets or various inserts at different positions of the storage ring, it will release stable, high-energy, and high-brightness light along the tangent direction of the deflection track, which is synchrotron radiation.
Simply put,HEPS can be regarded as a giant X-ray machine with ultra-precision, ultra-high speed and powerful penetrating power.
The small light beam it generates can penetrate materials, conduct three-dimensional scanning deep inside, and observe the microscopic world in multiple dimensions from the scale of molecules and atoms.
HEPS is a large scientific device for conducting scientific experiments, not an online photolithography machine factory.
The project is led by Lou Yu, a national survey and design master and chief scientist of SDIC, and collaborates with multiple technical research and design teams of China Electronics Institute.
From project feasibility study establishment to project implementation, China Electronics Institute has overcome a number of technical and process difficulties and solvedThe project has seven major technical problems including uneven settlement, micro-vibration control, ultra-long structural design, photovoltaic panel design, precision temperature control, process circulating cooling water system, and ultra-complex process system., achieved major technological breakthroughs, and indicator control has reached the international advanced level.
At present, the high-energy synchrotron radiation light source supporting project has been fully completed, taking a step closer to producing the "brightest" light in the world.
Although HEPS is not a photolithography factory, the reason why the information about the photolithography factory is so popular on self-media platforms is ultimately due to the public’s expectation to solve the “stuck neck” problem.
The China Electronics Institute is also continuing to make efforts on the road to assisting "China's core". From the beginning of its establishment, it has started the beginning of China's "core".
In recent years, China Electronics Institute has been deeply engaged in the semiconductor industry and has undertaken more than 50% of domestic memory chip projects, making important contributions to the country's technological self-reliance in the field of electronic information.
The China Electronics Institute has independently developed core algorithms and digital technologies, and has launched the "Advanced Electronic Manufacturing Digital Twin Factory Solution Version 1.0", committed to achieving the goal of "green, low-carbon, lean and efficient" production and manufacturing.
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