According to media reports, Dutch semiconductor equipment manufacturing giant ASML confirmed thatDelivered the first high numerical aperture (NA) extreme ultraviolet (EUV) lithography system to Intel.Numerical aperture is used to measure the angular range of light that an optical system can collect.By increasing the numerical aperture, smaller resolutions and higher resolving power can be achieved,Thus meeting the requirements of micro-machining.
According to reports,The cost of each new machine exceeds US$300 million (approximately 2.14 billion yuan).It can meet the needs of first-line chip manufacturers and be able to manufacture smaller and better chips in the next ten years.
ASML released a photo of part of the machine leaving its headquarters in Wildhoven, the Netherlands, in a protective box with a red ribbon around it.
ASML also said: “We are excited and proud to deliver our first high numerical aperture EUV system to Intel.”
When assembled, the machine will be larger than a truck.It will be shipped in 250 individual crates, including 13 large containers, and is expected to be used for commercial chip manufacturing starting in 2026 or 2027.
In addition to Intel,TSMC, Samsung, SK Hynix and Micron have also ordered this machine.