recently,Dutch lithography giant ASML announced that it will give priority to delivering its new high numerical aperture (HighNAEUV) extreme ultraviolet lithography machine to Intel.It is reported that,Each new machine costs more than $300 million, which helps computer chip makers produce smaller, faster semiconductors.
ASML's official social media account posted a photo of the scene. As you can see in the picture,Part of the lithography machine is placed in a protective box. The box, tied with a red ribbon, is ready to be shipped from its headquarters in Eindhoven, the Netherlands.
“A decade of pioneering science and systems engineering deserves a tribute! We are excited and proud to deliver our first high numerical aperture EUV lithography machine to Intel." ASML said.
It is understood that the high numerical aperture extreme ultraviolet lithography machine is larger than a truck when assembled and needs to be packed in 250 separate crates for transportation, including 13 large containers.
It is estimated that this lithography machine will be used for commercial chip manufacturing starting in 2026 or 2027.
Public information shows thatNA numerical aperture is an important indicator of the optical system of the lithography machine, which directly determines the actual resolution of lithography and the highest achievable process node.
Generally speaking, after the metal spacing is reduced to less than 30nm, that is, the corresponding process node exceeds 5nm, the resolution of the low numerical aperture lithography machine is not enough, and EUV double exposure or patternshaping technology can only be used to assist.
This will not only greatly increase the cost, but also reduce the yield rate. Therefore, higher numerical aperture becomes necessary.
ASML announced in September that it would ship the first high numerical aperture EUV lithography machine, model "TwinscanEXE:5000", by the end of this year, which can manufacture 2nm process and even more advanced chips.